CVD

CVD (Chemical Vapor Deposition) is a coating process in which precursor gases are introduced into a reaction chamber. Under the effect of heat, these gases chemically react at the surface of the component to form a thin solid layer, while gaseous by-products are evacuated.CVD enables the deposition of highly dense, uniform and conformal coatings, even on complex geometries. It is particularly valued for improving resistance to wear, corrosion and high temperatures, as well as enhancing certain electrical or chemical properties of components.

PVD

PVD (Physical Vapor Deposition) is a vacuum coating process used to deposit a thin layer of material onto a component. The material to be deposited is vaporized using an energy source (arc, sputtering, electron beam, etc.). The released atoms then travel through the vacuum chamber before condensing onto the substrate surface to form a thin film.This technique produces highly adherent, homogeneous and high-purity coatings, significantly improving wear and corrosion resistance, as well as the functional or decorative properties of components.